Electron-beam lithography (often abbreviated as e-beam lithography) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron sensitive film called a resist (`exposing`). The electron beam changes the solubility of the resist enabling selective removal of either the exposed or non-exposed.....
Found on
http://en.wikipedia.org/wiki/Electron-beam_lithography
(from the article `nanotechnology`) ...sources, such as extreme ultraviolet and X-ray, are being developed to allow lithographic printing techniques to reach dimensions from 10 to 100 ...
Found on
http://www.britannica.com/eb/a-z/e/19
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